Silicon tetrachloride (2025)

• Formula: Cl₄Si
• Molecular weight: 169.898

• IUPAC Standard InChI:InChI=1S/Cl4Si/c1-5(2,3)4

  

• IUPAC Standard InChIKey:FDNAPBUWERUEDA-UHFFFAOYSA-N
• CAS Registry Number: 10026-04-7
• Chemical structure:
  This structure is also available as a 2d Mol fileor as a computed3d SD file
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• Other names:Silane, tetrachloro-;Silicon chloride (SiCl4);Tetrachlorosilane;Tetrachlorosilicon;SiCl4;Silicon chloride;Silicon(IV) chloride;Chlorid kremicity;Extrema;Silicio(tetracloruro di);Siliciumtetrachlorid;Siliciumtetrachloride;Silicium(tetrachlorure de);Tetrachlorure de silicium;UN 1818;SIC-L(TM)
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• Information on this page:
  • Phase change data
  • References
  • Notes
• Other data available:
  • Gas phase thermochemistry data
  • Reaction thermochemistry data
  • Gas phase ion energetics data
  • Ion clustering data
  • IR Spectrum
  • Mass spectrum (electron ionization)
  • Vibrational and/or electronic energy levels
  • Gas Chromatography
• Data at other public NIST sites:
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  • Gas Phase Kinetics Database
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Phase change data

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Data compilation copyrightby the U.S. Secretary of Commerce on behalf of the U.S.A.All rights reserved.

Data compiled as indicated in comments:
BS - Robert L. Brown and Stephen E. Stein
TRC - Thermodynamics Research Center, NIST Boulder Laboratories, Chris Muzny director
AC - William E. Acree, Jr., James S. Chickos

Enthalpy of vaporization

Antoine Equation Parameters

log₁₀(P) = A − (B / (T + C))
P = vapor pressure (bar)
T = temperature (K)

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Enthalpy of sublimation

Enthalpy of fusion

References

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Data compilation copyrightby the U.S. Secretary of Commerce on behalf of the U.S.A.All rights reserved.

PCR Inc., 1990
PCR Inc.,Research Chemicals Catalog 1990-1991, PCR Inc., Gainesville, FL, 1990, 1. [all data]

Rugina, Gaspar, et al., 1987
Rugina, T.; Gaspar, M.; Sacarescu, L.,Liquid-vapor equilibrium for a binary system of dichlorodimethyl-silane with trichloromethylsilane, chloromethylsilane and silicontetrachloride.,Rev. Chim. (Bucharest), 1987, 38, 680. [all data]

Sauer and Hadsell, 1948
Sauer, R.O.; Hadsell, E.M.,Azeotropes of Trimethylchlorosilane and Silicon Tetrachloride,J. Am. Chem. Soc., 1948, 70, 4258-9. [all data]

Anonymous, 1955
Anonymous, R.,, Am. Pet. Inst. Res. Proj. 45, Tech. Rep. 14, No. 1, Ohio State Univ., 1955. [all data]

Parker and Robinson, 1927
Parker, T.W.; Robinson, P.L.,Critical Temperatures of Boron Trichloride and Silicon Tetrachloride.,J. Chem. Soc., 1927, 1927, 2977-81. [all data]

Jain and Yadav, 1973
Jain, D.V.S.; Yadav, O.P.,Indian J. Chem., 1973, 11, 28. [all data]

Capková and Fried, 1964
Capková, A.; Fried, V.,Gleichgewicht flüssigkeit-dampf im system tetrachlorsilan-trimethylchlorsilan,Collect. Czech. Chem. Commun., 1964, 29, 2, 336-340, https://doi.org/10.1135/cccc19640336. [all data]

Jenkins and Chambers, 1954
Jenkins, Arthur C.; Chambers, George F.,Vapor Pressures of Silicon Compounds,Ind. Eng. Chem., 1954, 46, 11, 2367-2369, https://doi.org/10.1021/ie50539a043. [all data]

Kearby, 1936
Kearby, K.,The Vapor Pressure of Silicon Tetrachloride,J. Am. Chem. Soc., 1936, 58, 2, 374-375, https://doi.org/10.1021/ja01293a503. [all data]

Jain and Yadav, 1973, 2
Jain, D.V.S.; Yadav, O.P.,Thermodynamics of n-Alkane Solutions: Part VIII - Vapour Pressures and Excess Free Energies for the SiCl₄/n-Hexane System,Indian J. Chem., 1973, 11, 28-30. [all data]

Balk and Dong, 1964
Balk, P.; Dong, D.,The Vapor Pressures of Silicon Tetrachloride and Germanium Tetrachloride below Their Melting Points,J. Phys. Chem., 1964, 68, 4, 960-962, https://doi.org/10.1021/j100786a507. [all data]

Devyatykh, Guesev, et al., 1985
Devyatykh, G.G.; Guesev, A.V.; Gibin, A.M.; Zhernenkov, N.V.; Zakharov, L.M.; Antipin, M.Yu.; Struchov, Yu.M.T.,Russ. J. Inorg. Chem., 1985, 30, 780. [all data]

Notes

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• Symbols used in this document:
  

  Tboil	Boiling point
  Tc	Critical temperature
  Tfus	Fusion (melting) point
  ΔfusH	Enthalpy of fusion
  ΔsubH	Enthalpy of sublimation
  ΔvapH	Enthalpy of vaporization

• Data from NIST Standard Reference Database 69:NIST Chemistry WebBook
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